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Proceedings Paper

Dimensional metrology with sub-nanometer uncertainty: unique role of AFM as the reference
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Paper Abstract

The 2007 edition of ITRS has introduced a new metric for metrology quality assessment - measurement uncertainty (MU). The new metric has precision as one of many uncertainty components. Additional significant components are tool matching, sampling uncertainty and sample-to-sample bias variation. Sample dependent bias variation and, therefore, MU can be measured accurately only if a reference metrology (RM) is employed. RM is a must for achieving and verifying required today sub-nanometer MU of critical dimension (CD) metrology. To insure long-term performance of in-line metrology and reliable process control a simple but efficient way is suggested - employment of in-line RM system. SI-traceable CD AFM with sub-nanometer MU is a proper RM tool for the task.

Paper Details

Date Published: 1 April 2010
PDF: 8 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76381C (1 April 2010); doi: 10.1117/12.846870
Show Author Affiliations
Vladimir A. Ukraintsev, Nanometrology International, Inc. (United States)
Johann Foucher, CEA-LETI (France)

Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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