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Proceedings Paper

Stochastic simulation of photon scattering for EUV mask defect inspection
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Paper Abstract

When EUV light is used to inspect mask defects, the reflective photons reveal information for both the mask structure and the mask defects. The number of reflective photons has to be enough for generating sufficient detector signals. A modeling technique based on Feynman path integral is utilized to calculate the number of reflective extreme-ultraviolet (EUV) photons scattered from photomask surfaces. For a 2D semicircular silicon defect, the capability of predicting the moving direction for each reemitting photon and the intensity of photons in different direction has been demonstrated.

Paper Details

Date Published: 22 March 2010
PDF: 6 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763624 (22 March 2010); doi: 10.1117/12.846695
Show Author Affiliations
Ting-Hang Pei, National Taiwan Univ. (Taiwan)
Kuen-Yu Tsai, National Taiwan Univ. (Taiwan)
Jia-Han Li, National Taiwan Univ. (Taiwan)

Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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