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Proceedings Paper

Contamination study on EUV exposure tools using SAGA light source (SAGA-LS)
Author(s): K. Murakami; T. Yamaguchi; A. Yamazaki; N. Kandaka; M. Shiraishi; S. Matsunari; T. Aoki; S. Kawata
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Paper Abstract

Dedicate beam line for R&D on contamination of EUV exposure tools (BL18) was constructed at Saga Light Source (SAGA-LS) and its operation has been started. BL18 has an advantage of long time exposure, which gives accurate data compared with high-EUV-intensity and short-time experiments using an undulator beam line at New SUBARU synchrotron facility. Carbon contamination growth under low irradiance EUV radiation with fluorocarbon gas injection was examined using Mo/Si multilayer mirror samples. In the EUV intensity region from 11 W/cm2 to 0.01 W/cm2, degradation rate of reflectivity did not depend on the EUV intensity. The degradation rate was proportional to the EUV intensity in the range of less than 0.01 W/cm2. Carbon contamination due to resist outgas during EUV exposure was also investigated.

Paper Details

Date Published: 22 March 2010
PDF: 7 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76361U (22 March 2010); doi: 10.1117/12.846676
Show Author Affiliations
K. Murakami, Nikon Corp. (Japan)
T. Yamaguchi, Nikon Corp. (Japan)
A. Yamazaki, Nikon Corp. (Japan)
N. Kandaka, Nikon Corp. (Japan)
M. Shiraishi, Nikon Corp. (Japan)
S. Matsunari, Nikon Corp. (Japan)
T. Aoki, Nikon Corp. (Japan)
S. Kawata, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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