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Proceedings Paper

Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings
Author(s): Alok Vaid; Matthew Sendelbach; Daniel Moore; Timothy Brunner; Nelson Felix; Pawan Rawat; Cornel Bozdog; Helen Kim; Michael Sendler; Stanislav Stepanov; Victor Kucerov
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Paper Abstract

Optical properties (n&k) of the material films under measurement are commonly assumed invariant and fixed in scatterometry modeling. This assumption keeps the modeling simple by limiting the number of floating parameters in the model. Such scatterometry measurement has the potential to measure with high precision some of the profile parameters (CD, Sidewall angle). The question is: if the optical properties modeled as "fixed" are actually changing - would this modeling assumption impact the accuracy of reported geometrical parameters? Using the example of a resist profile measurement, we quantify the "bias" effect of un-modeled variation of optical properties on the accuracy of the reported geometry by utilizing a traditional fixed n&k model. With a second model we float an additional optical parameter and lower the bias of the reported values - at the expense of slightly increased "noise" of the measurement (more floating parameters - less precision). Finally, we extend our multi-stack approach (previously introduced as enabler to the product-driven materials characterization methodology) to augment the spectral information and increase both precision and accuracy through the simultaneous modeling of multiple targets

Paper Details

Date Published: 1 April 2010
PDF: 12 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76381H (1 April 2010); doi: 10.1117/12.846648
Show Author Affiliations
Alok Vaid, GLOBALFOUNDRIES Inc. (United States)
Matthew Sendelbach, IBM Corp. (United States)
Daniel Moore, IBM Corp. (United States)
Timothy Brunner, IBM Corp. (United States)
Nelson Felix, IBM Corp. (United States)
Pawan Rawat, IBM Corp. (United States)
Cornel Bozdog, Nova Measuring Instruments Inc. (United States)
Helen Kim, Nova Measuring Instruments Inc. (United States)
Michael Sendler, Nova Measuring Instruments Inc. (United States)
Stanislav Stepanov, Nova Measuring Instruments Ltd. (Israel)
Victor Kucerov, Nova Measuring Instruments Ltd. (Israel)

Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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