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Proceedings Paper

Roadmap for traceable calibration of a 5-nm pitch length standard
Author(s): Donald A. Chernoff; David L. Burkhead
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Paper Abstract

Production of objects with 5 to 25 nm width or pitch requires metrology with picometer-scale accuracy. We imaged a new 70-nm pitch standard by AFM and made it traceable to the international (SI) meter. We describe data capture and analysis procedures that produce metrology-quality results from general purpose AFMs and SEMs. We suggest that traceable pitch standards are most useful when the expanded uncertainty (k=2, 95% confidence) is less than ±1.33% for single pitch values and ±0.5% for mean pitch. We show a projected chain of comparisons (roadmap) leading to a 5-nm pitch standard with expanded uncertainty of 52 pm (1.04%) for single values and 16 pm (0.32%) for the mean value, significantly better than the target.

Paper Details

Date Published: 1 April 2010
PDF: 10 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 763837 (1 April 2010); doi: 10.1117/12.846628
Show Author Affiliations
Donald A. Chernoff, Advanced Surface Microscopy, Inc. (United States)
David L. Burkhead, Advanced Surface Microscopy, Inc. (United States)

Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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