Share Email Print

Proceedings Paper

Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design
Author(s): Jue-Chin Yu; Peichen Yu
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Convergence speed and local minimum issue have been the major issues for inverse lithography. In this paper, we propose an inverse algorithm that employs an iterative gradient-descent method to improve convergence and reduce the Edge Placement Error (EPE). The algorithm employs a constrained gradient-based optimization to attain the fast converging speed, while a cross-weighting technique is introduced to overcome the local minimum trapping.

Paper Details

Date Published: 3 March 2010
PDF: 11 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76402L (3 March 2010);
Show Author Affiliations
Jue-Chin Yu, National Chiao Tung Univ. (Taiwan)
Peichen Yu, National Chiao Tung Univ. (Taiwan)

Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?