
Proceedings Paper
Measurement of EUV resists performances RLS by DUV light sourceFormat | Member Price | Non-Member Price |
---|---|---|
$17.00 | $21.00 |
Paper Abstract
Recently published experimental results indicate that current resists seem to be very hard to meet the International
Roadmap for Semiconductors (ITRS) goals for Resolution, Line Width Roughness (LWR) and Sensitivity (RLS)
simultaneously. This RLS trade-off has also been demonstrated through modeling work. RLS goals may not be possible
for lithographers to achieve all three simultaneously by applying current standard chemically amplified resists and
processes. In this paper, we have synthesized the various PAG(photo-acid generator) bound polymers for different anion
size and other molecular weight (Mw). In order to reach the EUV resist targets, we investigate the effect of diffusion
length on energy latitude(EL), resolution and LWR under DUV light and EUV exposure. We will also use DUV light to
explore the impact of DUV contrast on the RLS relationships in EUV performances. We have measured Eth and LWR in
DUV patterning process and correlated them with those obtained in EUV process. By using DUV light source we have
setup EUV resist pre-screening and improving method.
Paper Details
Date Published: 22 March 2010
PDF: 7 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362Y (22 March 2010); doi: 10.1117/12.846518
Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)
PDF: 7 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362Y (22 March 2010); doi: 10.1117/12.846518
Show Author Affiliations
Jeongsik Kim, Dongjin Semichem Co., Ltd. (Korea, Republic of)
Jae-Woo Lee, Dongjin Semichem Co., Ltd. (Korea, Republic of)
Jae-Woo Lee, Dongjin Semichem Co., Ltd. (Korea, Republic of)
Deogbae Kim, Dongjin Semichem Co., Ltd. (Korea, Republic of)
Jaehyun Kim, Dongjin Semichem Co., Ltd. (Korea, Republic of)
Jaehyun Kim, Dongjin Semichem Co., Ltd. (Korea, Republic of)
Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)
© SPIE. Terms of Use
