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Proceedings Paper

Novel molecular glass photoresist materials for next-generation lithography
Author(s): Arimichi Okumura; Yoshinori Funaki; Akira Takaragi; Kazuki Okamoto; Kiyoharu Tsutsumi; Keizo Inoue; Ryou Itaya; Kiyoshi Ikura; Yuki Iguchi
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Paper Abstract

A series of Adamantanephenol derivatives was synthesized from adamantinetriphenol / adamantinetrimethylhydroquinone and vinylether compound. Solubility for resist solvent or alkali developer of those materials and thermal properties were examined. Adamantanetrimethylhydroquinone cross-linked with divinylether (AmHQ-CL) had excellent properties as positive tone resist material. We evaluated lithographic properties of AmHQ-CL with photo acid generator and base. Line and space pattern was formed with EB exposure followed with post exposure bake and alkali development. Pattern of smooth wall surface was obtained by removing high molecular weight component from AmHQ-CL. Line width roughness (LWR) of the pattern AnHQ-CL nMWD was less than 30 nm. It was very small value compared with that of traditional polymer resist.

Paper Details

Date Published: 30 March 2010
PDF: 8 pages
Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76392E (30 March 2010); doi: 10.1117/12.846501
Show Author Affiliations
Arimichi Okumura, Daicel Chemical Industries, Ltd. (Japan)
Yoshinori Funaki, Daicel Chemical Industries, Ltd. (Japan)
Akira Takaragi, Daicel Chemical Industries, Ltd. (Japan)
Kazuki Okamoto, Daicel Chemical Industries, Ltd. (Japan)
Kiyoharu Tsutsumi, Daicel Chemical Industries, Ltd. (Japan)
Keizo Inoue, Daicel Chemical Industries, Ltd. (Japan)
Ryou Itaya, Daicel Chemical Industries, Ltd. (Japan)
Kiyoshi Ikura, Daicel Chemical Industries, Ltd. (Japan)
Yuki Iguchi, Daicel Chemical Industries, Ltd. (Japan)

Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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