Proceedings Paper
First generation laser-produced plasma source system for HVM EUV lithography| Format | Member Price | Non-Member Price |
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Paper Abstract
The 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography is under development. We
report latest status of the device which consists of the original concepts (1) CO2 laser driven Sn plasma, (2) Hybrid CO2
laser system that is combination of high speed (>100kHz) short pulse oscillator and industrial cw-CO2, (3) Magnetic
mitigation, and (4) Double pulse EUV plasma creation. Maximum burst on time power is 69W (100kHz, 0.7 mJ EUV
power @ intermediate focus), laser-EUV conversion efficiency is 2.3%, duty cycle is 20% at maximum. Continuous
operation time is so far up to 3 hours. Debris is efficiently suppressed by pre-pulse plasma formation and magnetic field
mitigation system. Long-term performance is now under investigation. Also future plan is updated.
Paper Details
Date Published: 19 March 2010
PDF: 10 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763608 (19 March 2010); doi: 10.1117/12.846271
Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)
PDF: 10 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763608 (19 March 2010); doi: 10.1117/12.846271
Show Author Affiliations
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
Tamotsu Abe, EUVA (Japan)
Yukio Watanabe, EUVA (Japan)
Takanobu Ishihara, EUVA (Japan)
Takeshi Ohta, EUVA (Japan)
Tsukasa Hori, EUVA (Japan)
Akihiko Kurosu, EUVA (Japan)
Tamotsu Abe, EUVA (Japan)
Yukio Watanabe, EUVA (Japan)
Takanobu Ishihara, EUVA (Japan)
Takeshi Ohta, EUVA (Japan)
Tsukasa Hori, EUVA (Japan)
Akihiko Kurosu, EUVA (Japan)
Hiroshi Komori, EUVA (Japan)
Kouji Kakizaki, EUVA (Japan)
Akira Sumitani, EUVA (Japan)
Osamu Wakabayashi, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Junichi Fujimoto, Gigaphoton Inc. (Japan)
Akira Endo, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Kouji Kakizaki, EUVA (Japan)
Akira Sumitani, EUVA (Japan)
Osamu Wakabayashi, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Junichi Fujimoto, Gigaphoton Inc. (Japan)
Akira Endo, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)
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