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Proceedings Paper

Photonic crystal microcavities in SOI waveguides produced in a CMOS environment
Author(s): Stefan Meister; Aws Al-Saadi; Bülent A. Franke; Shaimaa Mahdi; Berndt Kuhlow; Karsten Voigt; Bernd Tillack; Harald H. Richter; Lars Zimmermann; Viachaslau Ksianzou; Sigurd K. Schrader; Hans J. Eichler
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Paper Abstract

We have investigated microcavities in Silicon-on-Insolator (SOI) waveguides. The rectangular waveguides with 500 nm width are fabricated in the 220 nm silicon device layer. The microcavities are formed by one-dimensional photonic crystals in Fabry-Perot structure directly written in the waveguides. The SOI photonic structures are produced in a CMOS environment using 248 nm DUV lithography, where the waveguides as well as the photonic crystals are created in the same step using a single mask. In order to achieve a desired spectral shape of the filter function capable for several applications, a number of different cavities were investigated, e.g. single cavities of first and higher order as well as multi-cavity filters. The experimental results are compared with simulations of photonic crystal microcavities in strip waveguides. The spectral transmission function of such filters dependent on the design parameters are calculated by an analysis based on Finite-Difference-Time-Domain (FDTD) method.

Paper Details

Date Published: 16 February 2010
PDF: 10 pages
Proc. SPIE 7606, Silicon Photonics V, 760616 (16 February 2010); doi: 10.1117/12.842714
Show Author Affiliations
Stefan Meister, Technische Univ. Berlin (Germany)
Aws Al-Saadi, Technische Univ. Berlin (Germany)
Bülent A. Franke, Technische Univ. Berlin (Germany)
Shaimaa Mahdi, Technische Univ. Berlin (Germany)
Berndt Kuhlow, Technische Univ. Berlin (Germany)
Karsten Voigt, Technische Univ. Berlin (Germany)
Bernd Tillack, IHP GmbH (Germany)
Harald H. Richter, IHP GmbH (Germany)
Lars Zimmermann, IHP GmbH (Germany)
Viachaslau Ksianzou, Technische Fachhochschule Wildau (Germany)
Sigurd K. Schrader, Technische Fachhochschule Wildau (Germany)
Hans J. Eichler, Technische Univ. Berlin (Germany)

Published in SPIE Proceedings Vol. 7606:
Silicon Photonics V
Joel A. Kubby; Graham T. Reed, Editor(s)

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