Nanoimprint lithography (NIL) is an attractive method for its ability to quickly and cheaply pattern nano-scaled dimensions, and is an enabling technology for patterning large area substrates. The benefits of NIL are demonstrated through its application towards large area nanowire image arrays. In this work, we have fabricated and characterized top down silicon nanowire detector arrays by using UV curing NIL and deep Reactive Ion Etching techniques. Fabricated devices show over 10⁶ gain value at low incident light power, which is comparable to high sensitivity of an e-beam written lithography device. This technology is suitable for fabrication of high density, addressable imager arrays.

Date Published: 16 February 2010
PDF: 7 pages
Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 759106 (16 February 2010); doi: 10.1117/12.842276

Published in SPIE Proceedings Vol. 7591:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)