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Proceedings Paper

Dry etching of TiO2/SiO2 DBR mirrors for tunable optical sensor arrays
Author(s): O. Setyawati; M. Engenhorst; S. Wittzack; F. Köhler; C. Woidt; T. Woit; V. Daneker; M. Bartels; H. Hillmer
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Paper Abstract

We have investigated the etching characteristics of high-index-contrast TiO2/SiO2 DBR mirrors by inductively coupled plasma reactive ion etching (ICP-RIE) with a focus on the etch rate and the etch selectivity by varying etch parameters (gas flow rate, RF and ICP power, pressure and temperature). Chrome, aluminum and ITO (indium tin oxide) were applied as etch masks. Various mixtures of SF6/Ar gas were used for the etch processes. An optimum etch profile was obtained with an etch rate of approximately 80 nm/min at a pressure of 6 mTorr and a temperature of 20 °C. The experimental results were applied to develop Fabry-Perot filters for tunable optical sensor arrays.

Paper Details

Date Published: 16 February 2010
PDF: 8 pages
Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 75910R (16 February 2010); doi: 10.1117/12.841881
Show Author Affiliations
O. Setyawati, Univ. Kassel (Germany)
Opsolution Nanophotonics GmbH (Germany)
M. Engenhorst, Univ. Kassel (Germany)
S. Wittzack, Univ. Kassel (Germany)
F. Köhler, Univ. Kassel (Germany)
C. Woidt, Univ. Kassel (Germany)
T. Woit, Univ. Kassel (Germany)
Opsolution Nanophotonics GmbH (Germany)
V. Daneker, Univ. Kassel (Germany)
M. Bartels, Univ. Kassel (Germany)
H. Hillmer, Univ. Kassel (Germany)

Published in SPIE Proceedings Vol. 7591:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)

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