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Proceedings Paper

Fabrication and characterization of As2S3/Y3Fe5O12 and Y3Fe5O12/SOI strip-loaded waveguides for integrated optical isolator applications
Author(s): Lei Bi; Juejun Hu; Lionel Kimerling; C. A. Ross
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Paper Abstract

We report two novel strategies to integrate magneto-optical oxides on oxidized silicon and SOI platforms based on strip-loaded waveguide structures. By using conventional waveguide fabrication and thin film deposition techniques, strip-loaded waveguides for magneto-optical non-reciprocal phase shift (NRPS) applications can be integrated on a silicon platform. As a demonstration, two structures, i.e. As2S3/Y3Fe5O12 (YIG) and YIG/SOI waveguides are fabricated. Using pulsed-laser deposition followed by rapid thermal annealing, yttrium iron oxide films in which more than 95 vol.% had crystallized into the YIG phase were achieved on both substrates. The optical loss of the As2S3/Y3Fe5O12 waveguide was characterized by a cut-back method to be ~10 dB/cm at 1550 nm, while the optical loss of a 450nm wide YIG/SOI waveguide was determined to be 41 dB/cm at 1550 nm by measuring the quality factor Q of a pulley-type ring resonator consisting of such waveguides. The propagation loss of polycrystalline YIG on a SiO2/Si substrate was around 50 dB/cm at 1550 nm wavelength. The NRPS and figure of merit of both waveguides were simulated. It is suggested that a Bi:YIG or Ce:YIG layer may be integrated in these waveguide structures to achieve a higher NRPS and figure of merit for optical isolator applications. These waveguide fabrication techniques offer a compact, low cost and etch-free route for integrating magneto-optical materials on a silicon platform, which may be useful for making future integrated optical isolators and other magneto-optical components.

Paper Details

Date Published: 11 February 2010
PDF: 10 pages
Proc. SPIE 7604, Integrated Optics: Devices, Materials, and Technologies XIV, 760406 (11 February 2010); doi: 10.1117/12.841832
Show Author Affiliations
Lei Bi, Massachusetts Institute of Technology (United States)
Juejun Hu, Massachusetts Institute of Technology (United States)
Lionel Kimerling, Massachusetts Institute of Technology (United States)
C. A. Ross, Massachusetts Institute of Technology (United States)

Published in SPIE Proceedings Vol. 7604:
Integrated Optics: Devices, Materials, and Technologies XIV
Jean-Emmanuel Broquin; Christoph M. Greiner, Editor(s)

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