Share Email Print

Proceedings Paper

Nanostructured polymers by a compact laser plasma EUV source
Author(s): Henryk Fiedorowicz; Andrzej Bartnik; Roman Jarocki; Jerzy Kostecki; Miroslaw Szczurek
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

We report on the application of a compact laser plasma EUV source for processing of polymer materials. The EUV radiation in the wavelength of about 5 to 50 nm was produced by irradiation of xenon or krypton gas puff target with Nd:YAG laser operating at 10 Hz and delivering 4 ns pulses of energy up to 0.8 J per pulse. The source was equipped with a grazing incidence axisymmetrical ellipsoidal mirror to focus EUV radiation in the relatively broad spectral range with the maximum near 10 nm. The size of the focal spot was about 0.5 mm with the maximum fluence of 70 mJ/cm2 in a single pulse. Nanostructuring of polymer materials was achieved, primarily due to direct photo-etching with EUV photons. The results of the studies should be applicable in biomedical engineering.

Paper Details

Date Published: 26 February 2010
PDF: 8 pages
Proc. SPIE 7586, Synthesis and Photonics of Nanoscale Materials VII, 75860G (26 February 2010); doi: 10.1117/12.841682
Show Author Affiliations
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Roman Jarocki, Military Univ. of Technology (Poland)
Jerzy Kostecki, Military Univ. of Technology (Poland)
Miroslaw Szczurek, Military Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 7586:
Synthesis and Photonics of Nanoscale Materials VII
Jan J. Dubowski; David B. Geohegan; Frank Träger, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?