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Proceedings Paper

Refractive index engineering by fast ion implantations: a generic method for constructing multi-components electro-optical circuits
Author(s): Aharon J. Agranat; Alexander Gumennik; Harel Ilan
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Paper Abstract

Refractive index engineering (RI_Eng) by ion implantations is a generic methodology for constructing multi-component integrated circuits of electrooptic and nanophotonic devices with sub-wavelength features operating in the visible - near IR wavelengths. The essence of the method is to perform spatially selective implantations for sculpting complex 3D pre-designed amorphized patterns with sub-wavelength features and reduced refractive index within the volume of the substrate. A number of devices that were constructed in a substrate of potassium lithium tantalate niobate are described, including a submerged slab waveguide, an optical wire and a channel waveguide array.

Paper Details

Date Published: 11 February 2010
PDF: 17 pages
Proc. SPIE 7604, Integrated Optics: Devices, Materials, and Technologies XIV, 76040Y (11 February 2010); doi: 10.1117/12.841287
Show Author Affiliations
Aharon J. Agranat, The Hebrew Univ. of Jerusalem (Israel)
Alexander Gumennik, The Hebrew Univ. of Jerusalem (Israel)
Harel Ilan, The Hebrew Univ. of Jerusalem (Israel)

Published in SPIE Proceedings Vol. 7604:
Integrated Optics: Devices, Materials, and Technologies XIV
Jean-Emmanuel Broquin; Christoph M. Greiner, Editor(s)

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