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Proceedings Paper

Optical critical dimension measurements for patterned media with 10's nm feature size
Author(s): Yongdong Liu; Milad Tabet; Jiangtao Hu; Zhaoning Yu; Justin Hwu; Wei Hu; Sha Zhu; Gene Gauzner; Kim Lee; Shifu Lee
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Paper Abstract

Patterned media is expected to be implemented in future generations of hard disk drives to provide data storage at densities exceeding 1012 bits/in2 and beyond. The implementation of patterned media, which would involve developing processing methods to offer high resolution (small bits), regular patterns, and high density, has posed a number of metrology challenges. Optical Critical Dimension (OCD) is the leading candidate to overcome the metrology challenges for patterned media. This paper presents the successful OCD measurements on the critical dimensions, sidewall-angles, and detailed sidewall shape of gratings of quartz template and imprint disk with pitch as small as 57nm.

Paper Details

Date Published: 11 December 2009
PDF: 9 pages
Proc. SPIE 7520, Lithography Asia 2009, 75200H (11 December 2009); doi: 10.1117/12.839523
Show Author Affiliations
Yongdong Liu, Nanometrics, Inc. (United States)
Milad Tabet, Nanometrics, Inc. (United States)
Jiangtao Hu, Nanometrics, Inc. (United States)
Zhaoning Yu, Seagate Technology (United States)
Justin Hwu, Seagate Technology (United States)
Wei Hu, Seagate Technology (United States)
Sha Zhu, Seagate Technology (United States)
Gene Gauzner, Seagate Technology (United States)
Kim Lee, Seagate Technology (United States)
Shifu Lee, Seagate Technology (United States)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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