Share Email Print

Proceedings Paper

Imaging performance of production-worthy multiple-E-beam maskless lithography
Author(s): S. J. Lin; W. C. Wang; Jack J. H. Chen; Faruk Krecinic; Burn J. Lin; Guido de Boer; Erwin Slot; Remco Jager; Stijn Steenbrink; Bert-Jan Kampherbeek; Marco Wieland
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

E-beam maskless lithography is a potential solution for 32-nm half-pitch (HP) node and beyond. The major concern to implement it for mass production is whether its throughput can reach a production-worthy level. Without violating the law of physics using unrealistic e-beam current, parallelisms in the writing beams and the data path are a few possible solutions to achieve such high productivity. It has been proposed to realize throughput greater than 10 wafers per hour (WPH) from a single column with >10,000 e-beams writing in parallel, or even greater than 100 WPH by further clustering multiple columns within an acceptable tool footprint. The MAPPER concept contains a CMOS-MEMS blanker array supported by high-speed optical data-path architecture to simultaneously control this high number of beams, switching them on and off independently. The MAPPER pre-α tool with a 110-beam 5-keV column and a 300-mm wafer stage has been built and is ready for imaging test. In this paper, the resist imaging results of 110-beam parallel raster-scan writing for 32-nm logic circuit layout on 300-mm wafer is shown. The challenges of implementing multiple e-beam maskless lithography (MEBML2) in mass production environment, including illumination, focusing, and CD uniformity, are discussed.

Paper Details

Date Published: 12 December 2009
PDF: 7 pages
Proc. SPIE 7520, Lithography Asia 2009, 752009 (12 December 2009); doi: 10.1117/12.838573
Show Author Affiliations
S. J. Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
W. C. Wang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Jack J. H. Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Faruk Krecinic, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Burn J. Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Guido de Boer, MAPPER Lithography (Netherlands)
Erwin Slot, MAPPER Lithography (Netherlands)
Remco Jager, MAPPER Lithography (Netherlands)
Stijn Steenbrink, MAPPER Lithography (Netherlands)
Bert-Jan Kampherbeek, MAPPER Lithography (Netherlands)
Marco Wieland, MAPPER Lithography (Netherlands)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

© SPIE. Terms of Use
Back to Top