Pattern projection method based on phase-shifting technique in fringe analysis has been one of popular principles for three-dimensional shape measurement and profilometry. However, a few drawbacks are pointed out such as "large in size" and "heavy in weight" for practical usage in industrial applications. To improve these difficulties inherent to the conventional three-dimensional system based on pattern projection or structure light method, we try to incorporate recent digital devices such as a MEMS scanner. Due to this revision in projection optics, first of all, a compact measurement system is easily attainable, and, when we adjust the scanner to produce the reference pattern with non-equal periodical structure, the projected pattern is so formed as to be equal in period on the reference plane. In addition, the pattern becomes sharp over the whole field of measurement when the Scheimpflug condition is satisfied in optical arrangement. This brings easier analysis of the captured pattern and attains the three-dimensional profilometry system with deeper range of focus, wider field of measurement and higher result in accuracy of measurement.

Date Published: 24 November 2009
PDF: 8 pages
Proc. SPIE 7513, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Imaging and Process Technology, 751304 (24 November 2009); doi: 10.1117/12.838298

Published in SPIE Proceedings Vol. 7513:
2009 International Conference on Optical Instruments and Technology: Optoelectronic Imaging and Process Technology
Toru Yoshizawa; Ping Wei; Jesse Zheng, Editor(s)