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Proceedings Paper

Filtration condition study for enhanced microbridge reduction
Author(s): Toru Umeda; Fumitake Watanabe; Shuichi Tsuzuki; Toru Numaguchi
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Paper Abstract

Filtration products utilizing Nylon 6,6 membrane technology have demonstrated effectiveness in reducing microbridge defects in DUV photoresist patterning. The effects of fluid flow characteristics on defect reduction using a point-of-use Nylon 6,6 filtration product are explored. Lower filtration pressure and longer contact time were found to enhance the removal of gel-like microbridge defect precursors during point-of-use filtration of photoresist polymer solution. A kinetic study of high-pressure filtration, where a strong dependency of gel removal on contact time is observed, revealed the gel-like precursors are adsorbed to a greater extent at sites of polar Nylon 6,6 throughout the membrane depth. A study of gel capturing position by ICP-MS for low-pressure filtration, where gel removal is independent of contact time, revealed the gels are captured at the inlet portion of the filter, due to smaller transportation force, as compared to deeper into the filter media depth. These findings will be very useful both in optimizing filter operating procedures and in the development of next-generation filtration products, ultimately contributing toward reduced defectivity and increased yield within next-generation lithography processes.

Paper Details

Date Published: 12 December 2009
PDF: 7 pages
Proc. SPIE 7520, Lithography Asia 2009, 75201K (12 December 2009);
Show Author Affiliations
Toru Umeda, Nihon Pall Ltd. (Japan)
Fumitake Watanabe, Nihon Pall Ltd. (Japan)
Shuichi Tsuzuki, Nihon Pall Ltd. (Japan)
Toru Numaguchi, Nihon Pall Ltd. (Japan)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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