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Proceedings Paper

Fast converging inverse lithography algorithm incorporating image gradient descent methods
Author(s): Jue-Chin Yu; Peichen Yu
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Paper Abstract

In this paper, we develop an image-gradient-based algorithm to simultaneously optimize various cost functions for inverse mask design. The algorithm employs an iterative approach which evaluates the gradient decent of the resist image, aerial image, and the aerial image contrast with a pre-assigned step length. Moreover, an independent iteration step is inserted among iterations for binary mask conversion. We show that the proposed algorithm allows fast convergence while achieving high aerial image contrast. The impacts of each cost function on the pattern fidelity and convergence are also discussed.

Paper Details

Date Published: 12 December 2009
PDF: 13 pages
Proc. SPIE 7520, Lithography Asia 2009, 75200V (12 December 2009); doi: 10.1117/12.837514
Show Author Affiliations
Jue-Chin Yu, National Chiao Tung Univ. (Taiwan)
Peichen Yu, National Chiao Tung Univ. (Taiwan)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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