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Proceedings Paper

Ultra-sensitive optical metrology for hard disk DTR and BPM imprints
Author(s): Jeffrey Roberts; Linlin Hu; Iris Bloomer; Shih-Fu Lee; Yongdong Liu
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Paper Abstract

With pitches in the double-digit nanometer range and depths in the single-digit nanometer range, superior sensitivity is a necessary metrology requirement for patterned media. Variations in depth, CD, and sidewall angle on the order of the desired measurement precision will change the measured raw data by a miniscule amount, around one per cent or less. It is shown that the required sensitivity can be achieved with polarized broad band reflectance and transmittance incorporating optimized signal-to-noise and analysis based on Rigorous Coupled-Wave Analysis (RCWA) in conjunction with the Forouhi-Bloomer dispersion equations for optical properties, n and k. The measurement capabilities are demonstrated with simulations and examples of various DTR and BPM structures.

Paper Details

Date Published: 11 December 2009
PDF: 14 pages
Proc. SPIE 7520, Lithography Asia 2009, 75200I (11 December 2009); doi: 10.1117/12.837146
Show Author Affiliations
Jeffrey Roberts, n&k Technology, Inc. (United States)
Linlin Hu, n&k Technology, Inc. (United States)
Iris Bloomer, n&k Technology, Inc. (United States)
Shih-Fu Lee, Seagate Technology (United States)
Yongdong Liu, Seagate Technology (United States)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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