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Proceedings Paper

Optical coatings with ultralow refractive index SiO2 films
Author(s): Jue Wang; Bin Zhou; Jun Shen; Guangming Wu
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Paper Abstract

Advantages of utilizing ultralow refractive index layers in optical coatings include broadband and wide angle spectral performance. Ultralow refractive index films can be fabricated by chemical method and physical vapor deposition. In the chemical method, ultralow refractive indices are controlled by sol-gel derived nanostructures. In the physical method, ultralow refractive indices are obtained by self-shadowing nature in oblique angle deposition. Techniques for ultralow refractive index silica formation and characterizations are reviewed. Chemical, mechanical and optical properties of the ultralow refractive index silica are presented. Optical coatings consisting of the ultralow refractive index silica layers are discussed in a spectral regime from IR down to DUV.

Paper Details

Date Published: 31 December 2009
PDF: 9 pages
Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75040F (31 December 2009); doi: 10.1117/12.836252
Show Author Affiliations
Jue Wang, Corning Inc. (United States)
Bin Zhou, Tongji Univ. (China)
Jun Shen, Tongji Univ. (China)
Guangming Wu, Tongji Univ. (China)

Published in SPIE Proceedings Vol. 7504:
Laser-Induced Damage in Optical Materials: 2009
Gregory J. Exarhos; Vitaly E. Gruzdev; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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