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Proceedings Paper

Latest results and computing performance of the ePLACE data preparation tool
Author(s): J. Gramss; R. Galler; V. Neick; A. Stoeckel; U. Weidenmueller; D. Melzer; M. Suelzle; J. Butschke; U. Baetz
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Paper Abstract

At the EMLC 2009 in Dresden the data preparation package ePLACE was already presented. This package has been used for quite different applications covering mask write, direct write and special applications. In this paper we will disclose results achieved when using the ePLACE package for processing of layout data of immediate interest. During the evaluation phase of the new solution we could benefit from broad experience we collected over many years with the fracture performance of the MGS software, which is one core element of today's ePLACE package. A key interest of this paper is the investigation of the scalability of computing solutions as a cost-effective approach when processing huge data volumes with the new solution. This is reflected against current state-of-the-art data processing tasks being part of both mask write and direct write applications. Furthermore, we evaluated visualization and simulation possibilities of the ePLACE package with respect to its use with latest layouts in various applications. The improved performance of the data preparation package including its adaptation to new e-beam lithography options, as, for instance, the incorporation of the cell projection capability or the newly developed Multi Shaped Beam (MSB) technology, will be also discussed. As an example the matching of the data path with a Vistec SB3055 will be outlined. Processing of Design For E-Beam (DFEB) data (including cell contents) and their conversion to real exposure data is reported. The advantages of the parallel use of standard shaped beam und cell projection technologies are highlighted focussing on latest writing time yields achieved when applying the CP feature.

Paper Details

Date Published: 23 September 2009
PDF: 10 pages
Proc. SPIE 7488, Photomask Technology 2009, 748827 (23 September 2009); doi: 10.1117/12.835880
Show Author Affiliations
J. Gramss, Vistec Electron Beam GmbH (Germany)
R. Galler, EQUIcon Software GmbH Jena (Germany)
V. Neick, Vistec Electron Beam GmbH (Germany)
A. Stoeckel, Vistec Electron Beam GmbH (Germany)
U. Weidenmueller, Vistec Electron Beam GmbH (Germany)
D. Melzer, EQUIcon Software GmbH Jena (Germany)
M. Suelzle, EQUIcon Software GmbH Jena (Germany)
J. Butschke, IMS-Chips Stuttgart (Germany)
U. Baetz, Fraunhofer IPMS (Germany)

Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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