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Proceedings Paper

Nuisance event reduction using sensitivity control layers (SCL) for advanced photomask inspection
Author(s): Shad Hedges; Chin Le; Mark Eickhoff; Mark Wylie; Tim Simmons; Venugopal Vellanki; Jeff McMurran
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Paper Abstract

Conventional photomask inspection techniques utilize global sensitivity for all inspected area in the die; SRAF and OPC features become the sensitivity-limiters for advanced photomasks which can result in reduced sensitivity to defects of interest (DOI). We describe the implementation of Sensitivity Control Layer (SCL), a novel database inspection methodology for the KLA-Tencor TerascanHR platform to improve sensitivity and reduce nuisance detections. This methodology enables inspection at maximum sensitivity in critical die-areas via "layer definition" and reducing sensitivity to sub-resolution features during inspection which can dramatically improve false-rate. DRAM and FLASH inspection performance was improved through the use of up to 6-control layers to increase sensitivity in the active area while reducing false detections by as much as 100X. Post-inspection defect analysis, and improved disposition accuracy of the SCL-enabled inspections will also benefit cycle time and higher throughput. In all test cases, sensitivity parameters were increased in the regions of interest over baseline inspections run with typical, production-type inspection methodologies. SCL inspection-sensitivity management, and layer partitioning of OPC structures, SRAF's, and other sub-resolution features is discussed in detail.

Paper Details

Date Published: 27 May 2009
PDF: 8 pages
Proc. SPIE 7470, 25th European Mask and Lithography Conference, 74700U (27 May 2009); doi: 10.1117/12.835192
Show Author Affiliations
Shad Hedges, Phontronics nanoFab North America (United States)
Chin Le, Micron Technology, Inc. (United States)
Mark Eickhoff, KLA-Tencor Corp. (United States)
Mark Wylie, KLA-Tencor Corp. (United States)
Tim Simmons, Micron Technology, Inc. (United States)
Venugopal Vellanki, KLA-Tencor Corp. (United States)
Jeff McMurran, Phontronics nanoFab North America (United States)

Published in SPIE Proceedings Vol. 7470:
25th European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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