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Proceedings Paper

Simulation of surface plasmon nanolithography using tapered structure
Author(s): Xingzhang Wei; Xiaochun Dong; Chunlei Du
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Paper Abstract

A localized surface plasmon nanolithography (LSPN) technique using tapered structure is proposed and demonstrated to produce patterns with sub-wavelength feature size. The special masks with periodic taper tips are employed to excite surface plasmon polaritons (SPPs) on the illuminated side, and the SPP waves propagate toward the tips along the taper surface, which causes most of energy accumulation at the tips and gives rise to high local field enhancement in a nearfield region around the tips. Highly efficient nanolithography with sub-50nm feature size has been demonstrated by using the FDTD simulation results at different tip widths, at the same time, the variation of tip angel has been proved to have great influence on transmission efficiency, and also affects the line width.

Paper Details

Date Published: 18 May 2009
PDF: 5 pages
Proc. SPIE 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 72840O (18 May 2009);
Show Author Affiliations
Xingzhang Wei, Institute of Optics and Electronics (China)
Xiaochun Dong, Institute of Optics and Electronics (China)
Chunlei Du, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 7284:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Masaomi Kameyama; Xiangang Luo, Editor(s)

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