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Proceedings Paper

Align-and-shine photolithography
Author(s): Audrius Petrusis; Jan H. Rector; Kristen Smith; Sven de Man; Davide Iannuzzi
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Paper Abstract

At the beginning of 2009, our group has introduced a new technique that allows fabrication of photolithographic patterns on the cleaved end of an optical fibre: the align-and-shine photolithography technique (see A. Petrušis et al., "The align-and-shine technique for series production of photolithography patterns on optical fibres", J. Micromech. Microeng. 19, 047001, 2009). Align-and-shine photolithography combines standard optical lithography with imagebased active fibre alignment processes. The technique adapts well to series production, opening the way to batch fabrication of fibre-top devices (D. Iannuzzi et al., "Monolithic fibre-top cantilever for critical environments and standard applications", Appl. Phys. Lett. 88, 053501, 2006) and all other devices that rely on suitable machining of engineered parts on the tip of a fibre. In this paper we review our results and briefly discuss its potential applications.

Paper Details

Date Published: 5 October 2009
PDF: 4 pages
Proc. SPIE 7503, 20th International Conference on Optical Fibre Sensors, 75036Q (5 October 2009); doi: 10.1117/12.834240
Show Author Affiliations
Audrius Petrusis, Vrije Univ. Amsterdam (Netherlands)
Jan H. Rector, Vrije Univ. Amsterdam (Netherlands)
Kristen Smith, Vrije Univ. Amsterdam (Netherlands)
Sven de Man, Vrije Univ. Amsterdam (Netherlands)
Davide Iannuzzi, Vrije Univ. Amsterdam (Netherlands)

Published in SPIE Proceedings Vol. 7503:
20th International Conference on Optical Fibre Sensors
Julian D. C. Jones, Editor(s)

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