Proceedings Paper
Research on digital gray-tone projection lithography| Format | Member Price | Non-Member Price |
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Paper Abstract
With the development of MEMS and MOEMS technology, digital gray-toned maskless lithography will meet the demand
on devices manufacturing with its advantage of low cost, flexible and high efficiency. A kind of novel projection
lithography based on Digital Micromirror Device (DMD) was introduced in this paper. and the gray-tone and imaging
principle were analysed too. A projection optical system was designed based on DMD technology in this paper.
Experiments show that digital gray-tone projection lithography technology has advantage of high flexibility and
convenience, especially for the manufacturing of small production of specific structures.
Paper Details
Date Published: 18 May 2009
PDF: 4 pages
Proc. SPIE 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 728417 (18 May 2009); doi: 10.1117/12.832102
Published in SPIE Proceedings Vol. 7284:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Masaomi Kameyama; Xiangang Luo, Editor(s)
PDF: 4 pages
Proc. SPIE 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 728417 (18 May 2009); doi: 10.1117/12.832102
Show Author Affiliations
Jian Wang, Institute of Optics and Electronics (China)
Lixin Zhao, Institute of Optics and Electronics (China)
Wei Yan, Institute of Optics and Electronics (China)
Wnxiang Xu, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)
Lixin Zhao, Institute of Optics and Electronics (China)
Wei Yan, Institute of Optics and Electronics (China)
Wnxiang Xu, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)
Xiaoping Tang, Institute of Optics and Electronics (China)
Zhaozhi Wang, Institute of Optics and Electronics (China)
Shurong Wang, Institute of Optics and Electronics (China)
Zhengrong Zhang, Institute of Optics and Electronics (China)
Zhaozhi Wang, Institute of Optics and Electronics (China)
Shurong Wang, Institute of Optics and Electronics (China)
Zhengrong Zhang, Institute of Optics and Electronics (China)
Published in SPIE Proceedings Vol. 7284:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Masaomi Kameyama; Xiangang Luo, Editor(s)
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