As an important index, the characterization of nano-materials' topography is directly related with their competitive ability in micro-mechanical or information industries in which surface roughness and film's thickness play significant roles. With the developments of semiconducting materials and devices, the requirements for testing instruments are been changing from low accuracy, high accuracy to broad measuring range. To satisfy higher demands, the optical profiler method was introduced with different working principle which is briefly described in this paper. As real samples of nano-materials, such as multilayer films, their surface roughness and thickness were measured. In summary, this technique has excellent performance in its fast, non-contact, accurate and repeatable features.

Date Published: 18 May 2009
PDF: 4 pages
Proc. SPIE 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 728414 (18 May 2009); doi: 10.1117/12.832099

Published in SPIE Proceedings Vol. 7284:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Masaomi Kameyama; Xiangang Luo, Editor(s)