
Proceedings Paper
Analysis of parameters in fluid jet polishing by CFDFormat | Member Price | Non-Member Price |
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Paper Abstract
Parameters of fluid jet polishing (FJP) are analyzed in this paper. According to the theory of Computational Fluid
Dynamics, we simulated the process of fluid jet polishing by using Computational Fluid Dynamics software. Based on
the results of simulation, the distribution of flow field is showed and analyzed, and the distribution of important process
parameters including the velocity and pressure of work piece wall, the grain concentration of slurry are gained. By
analyzing the characteristic of FJP and the influences of Parameters to FJP, it is found that the distributions of pressure
and velocity on work piece wall are related to the distribution of removed material, and the impact angle influences the
distributions of velocity and material removal. By simulating fluid jet polishing process with different impact angle
models, we found the optimal impact angle to the distribution of material removal.
Paper Details
Date Published: 20 May 2009
PDF: 5 pages
Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72821Y (20 May 2009); doi: 10.1117/12.830892
Published in SPIE Proceedings Vol. 7282:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; John M. Schoen; Yoshiharu Namba; Shengyi Li, Editor(s)
PDF: 5 pages
Proc. SPIE 7282, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 72821Y (20 May 2009); doi: 10.1117/12.830892
Show Author Affiliations
Chun Yan Shi, Institute of Optics and Electronics (China)
Jia Hu Yuan, Institute of Optics and Electronics (China)
Fan Wu, Institute of Optics and Electronics (China)
Jia Hu Yuan, Institute of Optics and Electronics (China)
Fan Wu, Institute of Optics and Electronics (China)
Yong Jian Wan, Institute of Optics and Electronics (China)
Yu Han, Institute of Optics and Electronics (China)
Yu Han, Institute of Optics and Electronics (China)
Published in SPIE Proceedings Vol. 7282:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; John M. Schoen; Yoshiharu Namba; Shengyi Li, Editor(s)
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