
Proceedings Paper
Alignment error model of subaperture stitching interferometry for aspheric surface based on wavefront aberrationsFormat | Member Price | Non-Member Price |
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Paper Abstract
We present a novel strategies and a prototype for large optical surfaces test with subaperture stitching. The kinematics
model with six degrees of freedom is built to determine the initial configuration of each subaperture, according to the
records of nulling motion. An alignment error model based on wavefront aberrations is established for compensation and
error separation. Subapertures are primarily stitched by homogeneous coordinate transformation, least square method
and Zernike polynomial fitting. Then an error-separation matrix of stitching model is developed to analysis the
characteristics and effects of alignment error on test results. The expressions of the alignment errors for aspheric surface
testing are built based on motion structure and wavefront aberrations theory. So the alignment errors can be separated
and compensated efficiently. Subapertures are then simultaneously stitched by minimizing deviations among the
overlapping region, as well as deviations from the nominal surface. As a result, precise prior knowledge of the nulling
and alignment motion, which is of six degrees of freedom, is no longer required. Simulations and experiments are given
to verify the validity and precision of the proposed algorithm. The result shows that the proposed method with alignment
compensation is quite efficient.
Paper Details
Date Published: 20 May 2009
PDF: 5 pages
Proc. SPIE 7283, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 72830F (20 May 2009); doi: 10.1117/12.828598
Published in SPIE Proceedings Vol. 7283:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; James C. Wyant; Robert A. Smythe; Hexin Wang, Editor(s)
PDF: 5 pages
Proc. SPIE 7283, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 72830F (20 May 2009); doi: 10.1117/12.828598
Show Author Affiliations
Weibo Wang, Harbin Institute of Technology (China)
Jiubin Tan, Harbin Institute of Technology (China)
Jiubin Tan, Harbin Institute of Technology (China)
Liming Zhu, Harbin Institute of Technology (China)
Zhenggui Ge, Harbin Institute of Technology (China)
Zhenggui Ge, Harbin Institute of Technology (China)
Published in SPIE Proceedings Vol. 7283:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; James C. Wyant; Robert A. Smythe; Hexin Wang, Editor(s)
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