
Proceedings Paper
Optical, mechanical, and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMSFormat | Member Price | Non-Member Price |
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Paper Abstract
The paper presents the optical, mechanical, and electro-optical design of an interferometric inspection system for
massive parallel inspection of MicroElectroMechanicalSystems (MEMS) and MicroOptoElectroMechanicalSystems
(MOEMS). The basic idea is to adapt a micro-optical probing wafer to the M(O)EMS wafer under test. The probing
wafer is exchangeable and contains a micro-optical interferometer array. A low coherent and a laser interferometer
array are developed. Two preliminary interferometer designs are presented; a low coherent interferometer array based
on a Mirau configuration and a laser interferometer array based on a Twyman-Green configuration. The optical design
focuses on the illumination and imaging concept for the interferometer array. The mechanical design concentrates on
the scanning system and the integration in a standard test station for micro-fabrication. Models of single channel low
coherence and laser interferometers and preliminary measurement results are presented. The smart-pixel approach for
massive parallel electro-optical detection and data reduction is discussed.
Paper Details
Date Published: 17 June 2009
PDF: 12 pages
Proc. SPIE 7389, Optical Measurement Systems for Industrial Inspection VI, 73891J (17 June 2009); doi: 10.1117/12.828162
Published in SPIE Proceedings Vol. 7389:
Optical Measurement Systems for Industrial Inspection VI
Peter H. Lehmann, Editor(s)
PDF: 12 pages
Proc. SPIE 7389, Optical Measurement Systems for Industrial Inspection VI, 73891J (17 June 2009); doi: 10.1117/12.828162
Show Author Affiliations
Kay Gastinger, SINTEF (Norway)
Karl Henrik Haugholt, SINTEF (Norway)
Malgorzata Kujawinska, Warsaw Univ. of Technology (Poland)
Karl Henrik Haugholt, SINTEF (Norway)
Malgorzata Kujawinska, Warsaw Univ. of Technology (Poland)
Michal Jozwik, Warsaw Univ. of Technology (Poland)
Christoph Schaeffel, Institut für Mikroelektronik- und Mechatronik- Systeme gemeinnützige GmbH (Germany)
Stephan Beer, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
Christoph Schaeffel, Institut für Mikroelektronik- und Mechatronik- Systeme gemeinnützige GmbH (Germany)
Stephan Beer, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
Published in SPIE Proceedings Vol. 7389:
Optical Measurement Systems for Industrial Inspection VI
Peter H. Lehmann, Editor(s)
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