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Proceedings Paper

A model based approach to reference-free straightness measurement at the Nanometer Comparator
Author(s): C. Weichert; M. Stavridis; M. Walzel; C. Elster; A. Wiegmann; M. Schulz; R. Köning; J. Flügge; R. Tutsch
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Paper Abstract

The Nanometer Comparator is the PTB reference length measuring machine for high precision calibrations of line scales and encoder systems. Up to now the Nanometer Comparator allows to measure the position of line structures in one dimension only. For high precision characterisations of masks, scales and incremental encoders, the measurement of the straightness of graduations is a requirement from emerging lithography techniques. Therefore the Nanometer Comparator will be equipped with an additional short range measurement system in the Y-direction, realized as a single path plane mirror interferometer and supposed to achieve sub-nm uncertainties. To compensate the topography of the Y-mirror, the Traceable Multi Sensor (TMS) method will be implemented to achieve a reference-free straightness measurement. Virtual experiments are used to estimate the lower accuracy limit and to determine the sensitive parameters. The virtual experiments contain the influence of the positioning devices, interferometer errors as well as non-perfect adjustment and fabrication of the machine geometry. The whole dynamic measurement process of the Nanometer Comparator including its influence on the TMS analysis, e.g. non-equally spaced measurement points, is simulated. We will present the results of these virtual experiments as well as the most relevant error sources for straightness measurement, incorporating the low uncertainties of the existing and planned measurement systems.

Paper Details

Date Published: 17 June 2009
PDF: 10 pages
Proc. SPIE 7390, Modeling Aspects in Optical Metrology II, 73900O (17 June 2009); doi: 10.1117/12.827681
Show Author Affiliations
C. Weichert, Physikalisch-Technische Bundesanstalt (Germany)
M. Stavridis, Physikalisch-Technische Bundesanstalt (Germany)
M. Walzel, Physikalisch-Technische Bundesanstalt (Germany)
C. Elster, Physikalisch-Technische Bundesanstalt (Germany)
A. Wiegmann, Physikalisch-Technische Bundesanstalt (Germany)
M. Schulz, Physikalisch-Technische Bundesanstalt (Germany)
R. Köning, Physikalisch-Technische Bundesanstalt (Germany)
J. Flügge, Physikalisch-Technische Bundesanstalt (Germany)
R. Tutsch, Technische Univ. Braunschweig (Germany)

Published in SPIE Proceedings Vol. 7390:
Modeling Aspects in Optical Metrology II
Harald Bosse; Bernd Bodermann; Richard M. Silver, Editor(s)

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