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Proceedings Paper

Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography
Author(s): John E. Childers; Tom Baker; Tim Emig; James Carriere; Marc D. Himel
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Paper Abstract

The progress of immersion lithography toward the 22nm production node is putting more stringent requirements on the diffractive optics that are used for off-axis illumination. Tighter tolerances on pole balance, stray light, zeroth order, optical transmission, and matching of the far field output pattern to the design specification are in-turn requiring more accurate and repeatable optical testing. This paper will report on preliminary results from Tessera's new excimer diffractive optics test stand, including gauge capability and sources of variation, ending with a comparison of measurement capability to the required specifications.

Paper Details

Date Published: 21 August 2009
PDF: 8 pages
Proc. SPIE 7430, Laser Beam Shaping X, 74300S (21 August 2009); doi: 10.1117/12.827395
Show Author Affiliations
John E. Childers, Tessera North America (United States)
Tom Baker, Tessera North America (United States)
Tim Emig, Tessera North America (United States)
James Carriere, Tessera North America (United States)
Marc D. Himel, Tessera North America (United States)

Published in SPIE Proceedings Vol. 7430:
Laser Beam Shaping X
Andrew Forbes; Todd E. Lizotte, Editor(s)

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