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Proceedings Paper

Three-dimensional profilometry system incorporating a MEMS scanner
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Paper Abstract

To improve difficulties inherent to the conventional three-dimensional profiling system based on pattern projection method, we propose incorporating a recent digital device such as a MEMS scanner into projection optics. Due to this revision, first of all, a compact measurement system is easily attainable, and, when we adjust the scanner to produce the original pattern with non-equal periodical structure, the projected pattern is so formed as to be equal in period on the reference plane. In addition, the pattern becomes sharp over the whole field of measurement when the Scheimpflug condition is satisfied in optical arrangement. This brings easier analysis of the captured pattern and attains the threedimensional profilometry system with deeper range of focus, wider field of measurement and higher accuracy of measurement.

Paper Details

Date Published: 10 September 2009
PDF: 8 pages
Proc. SPIE 7432, Optical Inspection and Metrology for Non-Optics Industries, 74320P (10 September 2009); doi: 10.1117/12.825980
Show Author Affiliations
Toru Yoshizawa, Saitama Medical Univ. (Japan)
Toshitaka Wakayama, Saitama Medical Univ. (Japan)

Published in SPIE Proceedings Vol. 7432:
Optical Inspection and Metrology for Non-Optics Industries
Peisen S. Huang; Toru Yoshizawa; Kevin G. Harding, Editor(s)

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