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Proceedings Paper

Production of silicon mirror plates
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Paper Abstract

Silicon pore optics are currently under development for missions such as the International X-ray Observatory (IXO) as an alternative to the glass or nickel shell mirrors that were used in previous generation X-ray telescopes. The unprecedented effective area requirement of the IXO requires a modular optics design suitable for mass production. In this paper we discuss the current state-of-the-art in plate manufacturing technology. We provide examples of process innovations that have directly impacted the cost per mirror plate and have reduced the manufacturing cost of a mirror module. We show how a switch from silicon to silica as the reflective surface results in a simplified process flow without a corresponding change in the optical performance. We demonstrate how standard photolithographic techniques, applied in the semiconductor industry, can be used to pattern a reflective layer. The 5 arc-second angular resolution requirement of the IXO has stimulated a theoretical analysis of engineering tolerances in relation to angular resolution. We prove that improved control of the wedge angle by means of etch rate monitoring results in improved angular resolution. The results of this investigation will be used as the basis for future development in design for mass production.

Paper Details

Date Published: 31 August 2009
PDF: 9 pages
Proc. SPIE 7437, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV, 74370U (31 August 2009); doi: 10.1117/12.825960
Show Author Affiliations
Marinus B. Olde Riekerink, Micronit Microfluidics BV (Netherlands)
Bob Lansdorp, Micronit Microfluidics BV (Netherlands)
Lennart J. de Vreede, Micronit Microfluidics BV (Netherlands)
Marko T. Blom, Micronit Microfluidics BV (Netherlands)
Ronny van't Oever, Micronit Microfluidics BV (Netherlands)
Marcelo D. Ackermann, cosine Research B.V. (Netherlands)
Maximilien J. Collon, cosine Research B.V. (Netherlands)
Kotska Wallace, ESA-ESTEC (Netherlands)
Marcos Bavdaz, ESA-ESTEC (Netherlands)

Published in SPIE Proceedings Vol. 7437:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV
Stephen L. O'Dell; Giovanni Pareschi, Editor(s)

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