
Proceedings Paper
Silicon pore optics developmentFormat | Member Price | Non-Member Price |
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Paper Abstract
Future X-ray astrophysics missions, such as the International X-ray Observatory, IXO, require the development of novel
optics in order to deliver the mission's large aperture, high angular resolution and low mass requirements. A series of
activities have been pursued by ESA, leading a consortium of European industries to develop Silicon Pore Optics for use
as an x-ray mirror technology.
A novel process takes as the base mirror material commercially available silicon wafers, which have been shown to
possess excellent x-ray reflecting qualities. These are ribbed, curved and stacked concentrically in layers that have the
desired shape at a given radii of the x-ray aperture. Pairs of stacks are aligned and mounted into doubly reflecting mirror
modules that can be aligned into the x-ray aperture without the very high angular and position alignment requirements
that need to be achieved for mirror plates within the mirror module. The use of this silicon pore optics design
substantially reduces mirror assembly time, equipment and costs in comparison to alternative IXO mirror designs.
This paper will report the current technology development status of the silicon pore optics and the roadmap expected for
developments to meet an IXO schedule. Test results from measurements performed at the PTB lab of the Bessy
synchrotron facility and from full illumination at the Panter x-ray facility will be presented.
Paper Details
Date Published: 31 August 2009
PDF: 9 pages
Proc. SPIE 7437, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV, 74370T (31 August 2009); doi: 10.1117/12.825824
Published in SPIE Proceedings Vol. 7437:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV
Stephen L. O'Dell; Giovanni Pareschi, Editor(s)
PDF: 9 pages
Proc. SPIE 7437, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV, 74370T (31 August 2009); doi: 10.1117/12.825824
Show Author Affiliations
Kotska Wallace, ESA-ESTEC (Netherlands)
Marcos Bavdaz, ESA-ESTEC (Netherlands)
Philippe Gondoin, ESA-ESTEC (Netherlands)
Maximilien J. Collon, cosine Research B.V. (Netherlands)
Ramses Günther, cosine Research B.V. (Netherlands)
Marcelo Ackermann, cosine Research B.V. (Netherlands)
Marcos Bavdaz, ESA-ESTEC (Netherlands)
Philippe Gondoin, ESA-ESTEC (Netherlands)
Maximilien J. Collon, cosine Research B.V. (Netherlands)
Ramses Günther, cosine Research B.V. (Netherlands)
Marcelo Ackermann, cosine Research B.V. (Netherlands)
Marco W. Beijersbergen, cosine Research B.V. (Netherlands)
Mark Olde Riekerink, Micronit Microfluidics B.V. (Netherlands)
Marko Blom, Micronit Microfluidics B.V. (Netherlands)
Bob Lansdorp, Micronit Microfluidics B.V. (Netherlands)
Lennart de Vreede, Micronit Microfluidics B.V. (Netherlands)
Mark Olde Riekerink, Micronit Microfluidics B.V. (Netherlands)
Marko Blom, Micronit Microfluidics B.V. (Netherlands)
Bob Lansdorp, Micronit Microfluidics B.V. (Netherlands)
Lennart de Vreede, Micronit Microfluidics B.V. (Netherlands)
Published in SPIE Proceedings Vol. 7437:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV
Stephen L. O'Dell; Giovanni Pareschi, Editor(s)
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