
Proceedings Paper
Application of He ion microscopy for material analysisFormat | Member Price | Non-Member Price |
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$17.00 | $21.00 |
Paper Abstract
Helium ion beam microscopy (HIM) is a new high resolution imaging technique. The use of Helium ions instead of
electrons enables none destructive imaging combined with contrasts quite similar to that from Gallium ion beam
imaging. The use of very low probe currents and the comfortable charge compensation using low energy electrons offer
imaging of none conductive samples without conductive coating. An ongoing microelectronic sample with
Gold/Aluminum interconnects and polymer electronic devices were chosen to evaluate HIM in comparison to scanning
electron microscopy (SEM). The aim was to look for key applications of HIM in material analysis. Main focus was on
complementary contrast mechanisms and imaging of none conductive samples.
Paper Details
Date Published: 22 May 2009
PDF: 6 pages
Proc. SPIE 7378, Scanning Microscopy 2009, 73780C (22 May 2009); doi: 10.1117/12.825735
Published in SPIE Proceedings Vol. 7378:
Scanning Microscopy 2009
Michael T. Postek; Michael T. Postek; Michael T. Postek; Dale E. Newbury; Dale E. Newbury; Dale E. Newbury; S. Frank Platek; S. Frank Platek; S. Frank Platek; David C. Joy; David C. Joy; David C. Joy, Editor(s)
PDF: 6 pages
Proc. SPIE 7378, Scanning Microscopy 2009, 73780C (22 May 2009); doi: 10.1117/12.825735
Show Author Affiliations
F. Altmann, Fraunhofer Institute for Mechanics of Materials (Germany)
M. Simon, Fraunhofer Institute for Mechanics of Materials (Germany)
M. Simon, Fraunhofer Institute for Mechanics of Materials (Germany)
R. Klengel, Fraunhofer Institute for Mechanics of Materials (Germany)
Published in SPIE Proceedings Vol. 7378:
Scanning Microscopy 2009
Michael T. Postek; Michael T. Postek; Michael T. Postek; Dale E. Newbury; Dale E. Newbury; Dale E. Newbury; S. Frank Platek; S. Frank Platek; S. Frank Platek; David C. Joy; David C. Joy; David C. Joy, Editor(s)
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