
Proceedings Paper
Pyroelectric nanocomposite thin films containing triglycine sulfate nanocrystals with uniform polar orientationFormat | Member Price | Non-Member Price |
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Paper Abstract
A new pyroelectric polar nanocomposite thin film is presented. A dense array of aluminium oxide cylindrical nanopores
is used as a template to grow pyroelectric nano-crystals of TriGlycine Sulfate (TGS). The crystals are grown inside
nanopores having an average diameter of 14±4nm and a length of 0.5 micron. The crystals are grown with a preferred
crystallographic orientation having their polar axis [010] aligned in vertical to the film plane. The pyroelectric response
at different temperatures is measured using the dynamic method. The dielectric characterization reveals resistivity of
about 1E-9 ohm-m, dielectric loss (tan(δ)) of about 0.03, and relative dielectric permittivity of about 10 at room
temperature which increases to a maximum value at the ferroelectric-paraelectric phase transition. The pyroelectric
coefficient of the film is about 3.5 μC/m2K and the pyroelectric voltage figure of merit is about 40 kVm-1K -1.
Paper Details
Date Published: 27 August 2009
PDF: 9 pages
Proc. SPIE 7419, Infrared Systems and Photoelectronic Technology IV, 741906 (27 August 2009); doi: 10.1117/12.825670
Published in SPIE Proceedings Vol. 7419:
Infrared Systems and Photoelectronic Technology IV
Eustace L. Dereniak; Randolph E. Longshore; Ashok K. Sood; John P. Hartke; Paul D. LeVan, Editor(s)
PDF: 9 pages
Proc. SPIE 7419, Infrared Systems and Photoelectronic Technology IV, 741906 (27 August 2009); doi: 10.1117/12.825670
Show Author Affiliations
M. Nitzani, Technion-Israel Institute of Technology (Israel)
R. Yasinov, Technion-Israel Institute of Technology (Israel)
R. Yasinov, Technion-Israel Institute of Technology (Israel)
S. Berger, Technion-Israel Institute of Technology (Israel)
Published in SPIE Proceedings Vol. 7419:
Infrared Systems and Photoelectronic Technology IV
Eustace L. Dereniak; Randolph E. Longshore; Ashok K. Sood; John P. Hartke; Paul D. LeVan, Editor(s)
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