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Proceedings Paper

A novel method for overlay measurement by scatterometry
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Paper Abstract

The potential of scatterometry has been developed for many years, but it is challenging to accurately and quickly obtain the overlay error from diffraction data. We presented a method to measure the overlay error by choosing an optimal measurement target design for scatterometry. All of the simulations in this study were calculated by rigorous coupled wave analysis. A set of two layer grating model were developed for evaluation of overlay measurement sensitivity at different incident angle, such as theta (0° to 90°) and phi (0° to 180°). We also compared the optical response of zero order and first order diffraction signature. We can use appropriate target design and measured condition to maximize the overlay measurement sensitivity and reduce the noise from lithography printing error. In addition, the diffractive signature imaging microscope (DSIM) is introduced to measure the diffraction signature. This instrument is a full-optical operation system without any mechanical movement, so it has good stabilization.

Paper Details

Date Published: 10 September 2009
PDF: 8 pages
Proc. SPIE 7432, Optical Inspection and Metrology for Non-Optics Industries, 74320F (10 September 2009); doi: 10.1117/12.825091
Show Author Affiliations
Wei-Te Hsu, Industrial Technology Research Institute (Taiwan)
Yi-Sha Ku, Industrial Technology Research Institute (Taiwan)
Deh-Ming Shyu, Industrial Technology Research Institute (Taiwan)

Published in SPIE Proceedings Vol. 7432:
Optical Inspection and Metrology for Non-Optics Industries
Peisen S. Huang; Toru Yoshizawa; Kevin G. Harding, Editor(s)

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