Uniform coating of large areas is a technically challenging aspect of physical vapor deposition. This investigation shows that good film uniformity across large areas can be repetitively achieved by a DC magnetron sputtering process by use of multiple sources. A unique feature of this technique is the ability to predict and control the film distribution using the deposition rate, adding flexibility to the deposition system. A model for predicting the material distribution from multiple sources is presented. It will also be demonstrated that this process yields efficient use of the vapor generated from the sources, which results in higher deposition rates and less system maintenance.

Date Published: 20 August 2009
PDF: 11 pages
Proc. SPIE 7409, Thin Film Solar Technology, 740909 (20 August 2009); doi: 10.1117/12.824882

Published in SPIE Proceedings Vol. 7409:
Thin Film Solar Technology
Alan E. Delahoy; Louay A. Eldada, Editor(s)