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Proceedings Paper

XHR SEM: enabling extreme high resolution scanning electron microscopy
Author(s): Richard Young; Sander Henstra; Jarda Chmelik; Trevor Dingle; Albert Mangnus; Gerard van Veen; Ingo Gestmann
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Paper Abstract

The low voltage scanning electron microscope (SEM) is widely used in many industrial and research applications due to its ability to image surface details and to minimize charging and beam damage effects on sensitive samples. However, fundamental limitations in beam performance have existed, most notably in the chromatic aberration effects, which become larger as the beam voltage is reduced. The introduction of the extreme high resolution (XHR) SEM has demonstrated that sub-nanometer resolution can be achieved at low beam voltages, revealing fine surface detail. This system uses a source monochromator to reduce the effects of chromatic aberrations, resulting in a more tightly focused electron beam. Beam deceleration is available to provide a further improvement in imaging at low voltages and to give additional flexibility in optimizing the image contrast. While the monochromator is a necessary enabler of the improved imaging performance, further system elements, such as scanning, detectors, stage and environmental controls - that go into completing the SEM - are also key to the usability and throughput when it comes to practical day-to-day performance.

Paper Details

Date Published: 22 May 2009
PDF: 15 pages
Proc. SPIE 7378, Scanning Microscopy 2009, 737803 (22 May 2009); doi: 10.1117/12.824749
Show Author Affiliations
Richard Young, FEI Co. (United States)
Sander Henstra, FEI Co. (Netherlands)
Jarda Chmelik, FEI Czech Republic s.r.o. (Czech Republic)
Trevor Dingle, FEI Co. (Netherlands)
Albert Mangnus, FEI Co. (Netherlands)
Gerard van Veen, FEI Co. (Netherlands)
Ingo Gestmann, FEI Co. (Netherlands)

Published in SPIE Proceedings Vol. 7378:
Scanning Microscopy 2009
Michael T. Postek; Michael T. Postek; Michael T. Postek; Dale E. Newbury; Dale E. Newbury; Dale E. Newbury; S. Frank Platek; S. Frank Platek; S. Frank Platek; David C. Joy; David C. Joy; David C. Joy, Editor(s)

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