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Proceedings Paper

Optimizing computing resources for optimal throughput in a mask data preparation flow
Author(s): Weidong Zhang; Ron Bennett; Pradiptya Ghosh; Steffen Schulze; Amanda Bowhill
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Paper Abstract

The data volume is increasing exponentially in mask data preparation (MDP) flows for sub-45nm technologies, but time to market drives the acceptable total turnaround time. As a reasonable response, more computing resources are purchased to address these two issues. How to effectively use these resources including the latest CPUs, high-speed networking, and the fastest data storage devices is becoming an urgent problem to solve. A detailed study is conducted in an attempt to find an optimal solution to this problem. In particular, how CPU speed, bandwidth of network connections, and I/O speed of data storage devices affect the total turnaround time (TAT) in a mask data preparation flow is researched. For a given High Performance Computing (HPC) budget and MDP flow TAT constraints, methodologies to optimize HPC resources are proposed.

Paper Details

Date Published: 11 May 2009
PDF: 11 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73792Y (11 May 2009); doi: 10.1117/12.824349
Show Author Affiliations
Weidong Zhang, Mentor Graphics Corp. (United States)
Ron Bennett, Mentor Graphics Corp. (United States)
Pradiptya Ghosh, Mentor Graphics Corp. (United States)
Steffen Schulze, Mentor Graphics Corp. (United States)
Amanda Bowhill, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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