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Proceedings Paper

Phase-shift/transmittance measurements in a micro pattern using MPM193EX
Author(s): Hiroto Nozawa; Takayuki Ishida; Satoru Kato; Osamu Sato; Koji Miyazaki; Kiwamu Takehisa; Naoki Awamura; Hideo Takizawa; Hal Kusunose
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Paper Abstract

A new direct Phase-shift/Transmittance measurement tool "MPM193EX" has been developed to respond to the growing demand for higher precision measurements of finer patterns in ArF Lithography. Specifications of MPM193EX are listed below along with corresponding specifications of the conventional tool MPM193. 1) Phase-shift [3 Sigma]: 0.5 deg. (MPM193) => 0.2 deg. (MPM193EX) 2) Transmittance [3 Sigma]: 0.20 % (MPM193) => 0.04 % (MPM193EX) 3) Minimum measurement pattern width: 7.5 μm (MPM193) => 1.0 μm (MPM193EX) Furthermore, new design optics using an ArF Laser and an objective lens with long working distance allows measurements of masks with pellicles. The new method for improving the measurement repeatability is based on elimination of influence from instantaneous fluctuation in interferometer fringes by scanning two adjacent areas simultaneously. Also, MPM193EX is equipped with high-resolution and stable optics. The newly employed auto-focus system in MPM193EX accurately adjusts, by a new image processing method using high-resolution optics, the focus height that is one of the most important factors for measurements in a micro pattern.

Paper Details

Date Published: 11 May 2009
PDF: 10 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737925 (11 May 2009); doi: 10.1117/12.824318
Show Author Affiliations
Hiroto Nozawa, Lasertec Corp. (Japan)
Takayuki Ishida, Lasertec Corp. (Japan)
Satoru Kato, Lasertec Corp. (Japan)
Osamu Sato, Lasertec Corp. (Japan)
Koji Miyazaki, Lasertec Corp. (Japan)
Kiwamu Takehisa, Lasertec Corp. (Japan)
Naoki Awamura, Lasertec Corp. (Japan)
Hideo Takizawa, Lasertec Corp. (Japan)
Hal Kusunose, Lasertec Corp. (Japan)

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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