While photomask prices continue to increase and their lifetime continues to be shortened due to molecular contamination, it is a key issue to understand the chemical mechanism of the mask damage caused by haze problem to save fabrication cost. We show a unique method for in-situ Airborne Molecular Contamination, or AMC, measurement in the mask carrier mini-environment as well as the small volume confined under the pellicle protective film. Additionally, an ultimate solution to decontaminate the photomask and surrounding environment with a vacuum purging system shows preliminary positive results on the extension of photomask life time by elimination of the haze problem cause.

Date Published: 11 May 2009
PDF: 9 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73791G (11 May 2009); doi: 10.1117/12.824293

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)