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Proceedings Paper

Calibration strategies for precision stages in state-of-the-art registration metrology
Author(s): Alexander Huebel; Uwe Schellhorn; Michael Arnz; Gerd Klose; Dirk Beyer
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Paper Abstract

State-of-the-art pattern registration tools have to fulfill stringent requirements both in terms of reproducibility and accuracy, as photomask sets are often fabricated in a distributed fashion worldwide and yet have to perfectly match in their respective overlay properties. One option to calibrate the various metrology tools with respect to each other is to utilize a standard, a "golden mask." Alternatively, "self-calibration" strategies can be employed, which offer certain distinct advantages. This concept of calibration is illustrated by several examples. Merit functions are defined to compare the quality of the calibration procedures, and it is shown how they can be used to optimize the calibration with respect to its efficiency in filtering measurement noise. A symmetry based analysis is introduced to reveal systematic weaknesses of potential calibration sequences, also indicating the necessary steps to overcome these problems. An extension of the theory is given that allows to suppress a certain class of systematical errors, and it is studied under which conditions it can be applied.

Paper Details

Date Published: 11 May 2009
PDF: 12 pages
Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737914 (11 May 2009); doi: 10.1117/12.824281
Show Author Affiliations
Alexander Huebel, Carl Zeiss SMT AG (Germany)
Uwe Schellhorn, Carl Zeiss SMT AG (Germany)
Michael Arnz, Carl Zeiss SMT AG (Germany)
Gerd Klose, Carl Zeiss SMT AG (Germany)
Dirk Beyer, Carl Zeiss SMS GmbH (Germany)

Published in SPIE Proceedings Vol. 7379:
Photomask and Next-Generation Lithography Mask Technology XVI
Kunihiro Hosono, Editor(s)

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