Proceedings Paper
Interaction of intense ultrashort XUV pulses with silicon| Format | Member Price | Non-Member Price |
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Paper Abstract
Single shot radiation damage of bulk silicon induced by ultrashort XUV pulses was studied.
The sample was chosen because it is broadly used in XUV optics and detectors where
radiation damage is a key issue. It was irradiated at FLASH facility in Hamburg, which
provides intense femtosecond pulses at 32.5 nm wavelength. The permanent structural
modifications of the surfaces exposed to single shots were characterized by means of phase
contrast optical microscopy and atomic force microscopy. Mechanisms of different, intensity
dependent stages of the surface damage are described.
Paper Details
Date Published: 18 May 2009
PDF: 11 pages
Proc. SPIE 7361, Damage to VUV, EUV, and X-Ray Optics II, 736107 (18 May 2009);
Published in SPIE Proceedings Vol. 7361:
Damage to VUV, EUV, and X-Ray Optics II
Libor Juha; Saša Bajt; Ryszard Sobierajski, Editor(s)
PDF: 11 pages
Proc. SPIE 7361, Damage to VUV, EUV, and X-Ray Optics II, 736107 (18 May 2009);
Show Author Affiliations
R. Sobierajski, Institute of Physics (Poland)
FOM-Instituut voor Plasmafysica Rijnhuizen (Netherlands)
D. Klinger, Institute of Physics (Poland)
M. Jurek, Institute of Physics (Poland)
J. B. Pelka, Institute of Physics (Poland)
L. Juha, Institute of Physics (Czech Republic)
J. Chalupský, Institute of Physics (Czech Republic)
Czech Technical Univ. (Czech Republic)
J. Cihelka, Institute of Physics (Czech Republic)
V. Hakova, Institute of Physics (Czech Republic)
FOM-Instituut voor Plasmafysica Rijnhuizen (Netherlands)
D. Klinger, Institute of Physics (Poland)
M. Jurek, Institute of Physics (Poland)
J. B. Pelka, Institute of Physics (Poland)
L. Juha, Institute of Physics (Czech Republic)
J. Chalupský, Institute of Physics (Czech Republic)
Czech Technical Univ. (Czech Republic)
J. Cihelka, Institute of Physics (Czech Republic)
V. Hakova, Institute of Physics (Czech Republic)
L. Vysin, Institute of Physics (Czech Republic)
U. Jastrow, HASYLAB/DESY (Germany)
N. Stojanovic, HASYLAB/DESY (Germany)
S. Toleikis, HASYLAB/DESY (Germany)
H. Wabnitz, HASYLAB/DESY (Germany)
J. Krzywinski, SLAC National Accelerator Lab. (United States)
S. Hau-Reige, Lawrence Livermore National Lab. (United States)
R. London, Lawrence Livermore National Lab. (United States)
U. Jastrow, HASYLAB/DESY (Germany)
N. Stojanovic, HASYLAB/DESY (Germany)
S. Toleikis, HASYLAB/DESY (Germany)
H. Wabnitz, HASYLAB/DESY (Germany)
J. Krzywinski, SLAC National Accelerator Lab. (United States)
S. Hau-Reige, Lawrence Livermore National Lab. (United States)
R. London, Lawrence Livermore National Lab. (United States)
Published in SPIE Proceedings Vol. 7361:
Damage to VUV, EUV, and X-Ray Optics II
Libor Juha; Saša Bajt; Ryszard Sobierajski, Editor(s)
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