
Proceedings Paper
Evaluation of focus measures under different wavefront aberrations for deformable mirror control in adaptive optics systemsFormat | Member Price | Non-Member Price |
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Paper Abstract
In conventional Adaptive optics (AO) system, wavefront aberration is measured by wavefront sensor. However, a point
source is usually not available in most imaging systems. Therefore development of deformable mirror control scheme in
adaptive optics system based on vision information will extend the application area of AO technique. A focus measure
(FM) is a measure of image quality and can be calculated from image data obtained from the image sensor. It can be
used to find the optimal shape of the deformable mirror that compensates the wavefront aberration. In this paper, we
analyze the performance of focus measures under different types of wavefront aberrations. The relation of FM vs. the
aberration strength is analyzed systematically for different aberration modes and different FM functions. The FM
performance under combination of aberrations is also investigated. This research supplies a guide for selection of the
suitable FM function and strategy for control of deformable mirror in the AO system.
Paper Details
Date Published: 18 November 2008
PDF: 12 pages
Proc. SPIE 7138, Photonics, Devices, and Systems IV, 713805 (18 November 2008); doi: 10.1117/12.817969
Published in SPIE Proceedings Vol. 7138:
Photonics, Devices, and Systems IV
Pavel Tománek; Dagmar Senderáková; Miroslav Hrabovský, Editor(s)
PDF: 12 pages
Proc. SPIE 7138, Photonics, Devices, and Systems IV, 713805 (18 November 2008); doi: 10.1117/12.817969
Show Author Affiliations
Hyungsuck Cho, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Xiaodong Tao, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Xiaodong Tao, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Deokhwa Hong, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Published in SPIE Proceedings Vol. 7138:
Photonics, Devices, and Systems IV
Pavel Tománek; Dagmar Senderáková; Miroslav Hrabovský, Editor(s)
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