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Proceedings Paper

SCATT: software to model scatterometry using the rigorous electromagnetic theory
Author(s): S. Babin; L. Doskolovich; Y. Ishibashi; A. Ivanchikov; N. Kazanskiy; I. Kadomin; T. Mikami; Y. Yamazaki
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Paper Abstract

Measurement of critical dimensions and vertical shape of features in semiconductor manufacturing is a critical task. Optical scatterometry proved capable of providing such measurements. In this paper, a software tool to model scatterometry was developed. Rigorous coupled wavelength analysis (RCWA) is used as a physical model. This software does not use fitting coefficients of any specific equipment and therefore is useful in understanding, analysis and optimization of measurements of specific patterns and potential sensitivity of methods and systems to process variation. Special attention was given to improve the accuracy and throughput of simulation; results of comparison to another software proved advantages of the developed software.

Paper Details

Date Published: 23 March 2009
PDF: 7 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72723X (23 March 2009); doi: 10.1117/12.816904
Show Author Affiliations
S. Babin, aBeam Technologies (United States)
L. Doskolovich, aBeam Technologies (United States)
Y. Ishibashi, Toshiba Corp. (Japan)
A. Ivanchikov, aBeam Technologies (United States)
N. Kazanskiy, aBeam Technologies (United States)
I. Kadomin, aBeam Technologies (United States)
T. Mikami, Toshiba Corp. (Japan)
Y. Yamazaki, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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