Typical extreme ultraviolet (EUV) photoresist is known to outgas carbon-containing molecules, which is of particular concern to the industry as these molecules tend to contaminate optics and diminish reflectivity. This prompted extensive work to measure these species and the quantities that they outgas in a vacuum environment. Experiments were performed to test whether the outgassing rate of these carbon-containing molecules is directly proportional to the rate at which the EUV photons arrive and whether a very high power exposure will cause the same amount of outgassing as a much lower power exposure with the dose unchanged.

Date Published: 18 March 2009
PDF: 7 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 727126 (18 March 2009);

Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)