Share Email Print

Proceedings Paper

Stochastic modeling in lithography: the use of dynamical scaling in photoresist development
Author(s): Chris A. Mack
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The concepts of dynamical scaling in the study of kinetic roughness are applied to the problem of photoresist development. Uniform, open-frame exposure and development of photoresist corresponds to the problem of quenched noise and the etching of random disordered media and is expected to fall in the Kadar-Parisi-Zhang (KPZ) universality class. To verify this expectation, simulations of photoresist development in 1+1 dimensions were carried out with random, uncorrelated noise added to an otherwise uniform development rate. The resulting roughness exponent α and the growth exponent β were found to match the 1+1 KPZ values exactly.

Paper Details

Date Published: 1 April 2009
PDF: 15 pages
Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72732I (1 April 2009); doi: 10.1117/12.815379
Show Author Affiliations
Chris A. Mack, (United States)

Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

© SPIE. Terms of Use
Back to Top